GaAs is so high that a corresponding layer would be only a few micrometers thick and mechanically unstable.
Silicon is a pure element, avoiding the problems of stoichiometric imbalance and thermal unmixing of GaAs.
Silicon has a nearly perfect lattice, impurity density is very low and allows to build very small structures (currently down to 25 nm). GaAs in contrast has a very high impurity density, which makes it difficult to build ICs with small structures, so the 500 nm process is a common process for GaAs.